首页> 外国专利> Capacitive structure for semiconductor technology in e.g. consumer electronics, industries and automobile electronics has trench which adjoins trough zone, which forms second electrode of capacitive structure, formed in semiconductor body

Capacitive structure for semiconductor technology in e.g. consumer electronics, industries and automobile electronics has trench which adjoins trough zone, which forms second electrode of capacitive structure, formed in semiconductor body

机译:半导体技术中的电容结构消费类电子产品,工业和汽车电子产品具有与槽区相邻的沟槽,该沟槽形成了形成在半导体主体中的电容结构的第二电极

摘要

Capacitive structure has trench (3) which adjoins to a surface (2) of semiconductor body (1). An adjacent isolation layer (4) is arranged within trench and semiconductor body. Trench adjoins trough zone (6), formed in semiconductor body, from first type of conductivity inversed to second type of conductivity. The trough zone forms second electrode of capacitive structure. An independent claim is also included for: the manufacture of the capacitive structure.
机译:电容性结构具有邻接半导体本体(1)的表面(2)的沟槽(3)。相邻的隔离层(4)布置在沟槽和半导体体内。沟槽从形成在半导体本体中的沟槽区域(6)邻接,从第一类型的电导率反转为第二类型的电导率。谷区形成电容结构的第二电极。还包括以下独立权利要求:电容结构的制造。

著录项

  • 公开/公告号DE102004063560A1

    专利类型

  • 公开/公告日2006-07-20

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE20041063560

  • 发明设计人 KROTSCHEK THOMAS;VANNUCCI NICOLA;

    申请日2004-12-30

  • 分类号H01L27/08;H01L21/822;

  • 国家 DE

  • 入库时间 2022-08-21 21:20:30

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