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Device for producing three-dimensional structures of materials in the micro- or nano-meter region in micro-electronics production comprises a vacuum chamber containing a media chamber, a reaction chamber and a coupling unit
Device for producing three-dimensional structures of materials in the micro- or nano-meter region in micro-electronics production comprises a vacuum chamber containing a media chamber, a reaction chamber and a coupling unit
Device for producing three-dimensional structures of materials in the micro- or nano-meter region comprises a vacuum chamber (VK) containing a media chamber (MR) for storing one or more media, a reaction chamber (RK) for producing an ion beam (IS) from the media fed to the reaction chamber and a coupling unit (IO) for coupling an ion beam from the reaction chamber in the direction of the material to be processed. An independent claim is also included for a method for producing three-dimensional structures of materials in the micro- or nano-meter region using the above device.
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