首页> 外国专利> Semiconductor device, e.g. insulated gate bipolar transistor, has floating area including penetration depth in drift areas, where depth corresponds to another two penetration depths of base areas and trenches

Semiconductor device, e.g. insulated gate bipolar transistor, has floating area including penetration depth in drift areas, where depth corresponds to another two penetration depths of base areas and trenches

机译:半导体器件绝缘栅双极晶体管,其浮动区域包括漂移区中的穿透深度,该深度对应于基极区和沟槽的另外两个穿透深度

摘要

Semiconductor device has a semiconductor body between front and rear side contacts with front and rear side surfaces. Control electrodes are embedded against base areas (3) in trenches, such that current flow between emitter areas (9) and drift areas is controllable by the electrodes. A floating area (5) has a penetration depth in the drift areas, where the depth corresponds to another two penetration depths of the base areas and the trenches.
机译:半导体器件在具有前后侧面的前后接触之间具有半导体本体。控制电极被嵌入沟槽中的基区(3),从而在发射极区(9)和漂移区之间的电流可由电极控制。浮动区域(5)在漂移区域中具有穿透深度,其中该深度对应于基础区域和沟槽的另外两个穿透深度。

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