首页> 外国专利> Apparatus for regenerating and recycling soiled fluid from cleaning of sawn wafer blocks, especially of silicon, comprising centrifuge for removing solids and fluid supply and recycling systems

Apparatus for regenerating and recycling soiled fluid from cleaning of sawn wafer blocks, especially of silicon, comprising centrifuge for removing solids and fluid supply and recycling systems

机译:用于清洁和清洁锯割的晶片块(特别是硅)的脏污流体的设备,该设备包括用于去除固体的离心机以及流体供应和回收系统

摘要

Apparatus for regenerating soiled cleaning fluid from the cleaning of sawn wafer blocks comprises a centrifuge (104) for removing solids from the soiled fluid; a supply system (102, 110, 112) for transferring the soiled fluid from the block cleaning device (100) to the centrifuge; and a recycling system (106, 114, 116) for returning the purified fluid to the block cleaning device.
机译:用于从清洗的晶片块的清洁中再生污染的清洁流体的设备包括:离心机(104),用于从污染的流体中去除固体;供给系统(102、110、112),用于将脏的流体从块清洁装置(100)转移到离心机;循环系统(106、114、116),用于将净化后的流体返回到块清洁装置。

著录项

  • 公开/公告号DE202005019078U1

    专利类型

  • 公开/公告日2006-04-13

    原文格式PDF

  • 申请/专利权人 STANGL SEMICONDUCTOR EQUIPMENT AG;

    申请/专利号DE20052019078U

  • 发明设计人

    申请日2005-12-06

  • 分类号C02F1/38;B04B1/00;

  • 国家 DE

  • 入库时间 2022-08-21 21:19:51

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