首页> 外国专利> Illumination device for mask aligner, has solid state device ultra violet light sources that emit light with wavelength between specified nanometers, where sources are individually controllable and repeatedly activated and switched off

Illumination device for mask aligner, has solid state device ultra violet light sources that emit light with wavelength between specified nanometers, where sources are individually controllable and repeatedly activated and switched off

机译:用于掩模对准器的照明设备,具有固态设备紫外线光源,该光源发出波长在指定纳米之间的光,其中的光源可单独控制并反复激活和关闭

摘要

The device has a field lens and a set of solid state device ultra violet light sources (15) that emit light with wavelength that ranges between 250 nanometers and 450 nanometers. The solid state ultra violet light sources are individually controllable and are arranged on a cooling surface that is cooled with a cooling medium e.g. air or water. The light sources are repeatedly activated and switched off. An independent claim is also included for a mask aligner with a positioning device.
机译:该装置具有物镜和一组固态装置紫外光源(15),该紫外光源发射波长在250纳米至450纳米之间的光。固态紫外光源是可单独控制的,并且布置在用例如冷媒等冷却介质冷却的冷却面上。空气或水。光源被反复激活和关闭。还包括具有定位装置的掩模对准器的独立权利要求。

著录项

  • 公开/公告号DE202006003924U1

    专利类型

  • 公开/公告日2006-06-14

    原文格式PDF

  • 申请/专利权人 SUESS MICROTEC LITHOGRAPHY GMBH;

    申请/专利号DE20062003924U

  • 发明设计人

    申请日2006-03-13

  • 分类号G03F7/20;

  • 国家 DE

  • 入库时间 2022-08-21 21:19:43

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