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A method for polishing a germanium surface by means of a mild combined chemical and mechanical polishing action, for use in the fabrication of microelectronic components

机译:一种通过温和的化学和机械结合抛光作用抛光锗表面的方法,用于制造微电子元件

摘要

Polishing of a germanium surface includes a polishing operation with at least one polishing agent and a solution with a light attack of germanium.
机译:锗表面的抛光包括使用至少一种抛光剂和具有锗的光侵蚀性的溶液进行的抛光操作。

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