METHOD AND INSTALLATION FOR PROCESSING A GLASS SUBSTRATE INCORPORATING A MAGNETRON LINE AND A DEVICE GENERATING ATMOSPHERIC PRESSURE PLASMA.

摘要

- Process for the continuous treatment of a glass substrate whose dimension perpendicular to the direction of movement along said installation is greater than 1.5 m, said method being characterized in that it comprises inter alia: a step a magnetron line for effecting the deposition of successive thin layers, said line comprising a succession of sections, each section comprising at least one cathode made of a material or a precursor of the material to be deposited and operating according to the principle of sputtering under the action of a plasma generated by electric discharge in a plasma gas, - at least one step using an atmospheric plasma device, ie generating and allowing a plasma treatment in a gas substantially at atmospheric pressure.- Installation allowing the implementation of the process