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COPPER BALL FOR ANODE FOR COPPER PLATING, PLATING APPARATUS, COPPER PLATING METHOD AND METHOD OF MANUFACTURING PRINTED BOARD

机译:用于镀铜阳极的铜球,镀覆装置,铜镀覆方法和制造印刷板的方法

摘要

PROBLEM TO BE SOLVED: To improve plating characteristics such as uniformity of electrodeposition by suppressing the peeling-off of a black film formed on the surface of a copper ball of an anode for copper plating.;SOLUTION: The copper ball for the anode is used as the anode for copper plating and comprises crystal grains of copper containing phosphorus element, wherein ≥70% of the number of the crystal grains in total crystal grains constituting the copper ball for the anode has ≥10 μm minor axis and ≥60% of the number of the crystal grains in total crystal grains constituting the copper ball for the anode has ≥30 mμ major axis.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:通过抑制在用于镀铜的阳极的铜球表面上形成的黑膜的剥落来改善电镀特性,例如电沉积的均匀性;解决方案:使用用于阳极的铜球作为用于镀铜的阳极,它包含含铜磷元素的晶粒,其中构成阳极用铜球的全部晶粒中,晶粒总数的70%具有10微米的短轴和;构成阳极用铜球的全部晶粒中,晶粒总数的60%为≥30mμ。主轴;版权:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP2007262456A

    专利类型

  • 公开/公告日2007-10-11

    原文格式PDF

  • 申请/专利权人 HITACHI CABLE LTD;

    申请/专利号JP20060086413

  • 申请日2006-03-27

  • 分类号C25D17/10;C25D7/00;H01L21/288;H05K3/42;

  • 国家 JP

  • 入库时间 2022-08-21 21:16:20

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