首页> 外国专利> PATTERN INSPECTION SYSTEM, PATTERN INSPECTION METHOD, SAMPLE TO BE INSPECTED, AND METHOD FOR MANAGING SAMPLE TO BE INSPECTED

PATTERN INSPECTION SYSTEM, PATTERN INSPECTION METHOD, SAMPLE TO BE INSPECTED, AND METHOD FOR MANAGING SAMPLE TO BE INSPECTED

机译:图案检查系统,图案检查方法,要检查的样品以及用于管理要检查的样品的方法

摘要

PROBLEM TO BE SOLVED: To provide a pattern inspection system and a pattern inspection method for inspecting a deterioration of an image of a sample to be inspected, a sample to be inspected obtained by it, and a method for managing a sample to be inspected.;SOLUTION: The pattern inspection system comprises an optical image acquisition section for acquiring an optical image of the sample to be inspected, a reference-image memory device for storing the optical image of the sample to be inspected as a reference image, an image-to-be-inspected memory device for acquiring the optical image of the sample to be inspected by the optical image acquisition section after the acquisition of the reference image and storing the optical image as an image to be inspected, and a comparison processing section for comparing the reference image with the image to be inspected. The pattern inspection system compares the reference image of the sample to be inspected read from the reference-image memory device with the image to be inspected of the sample to be inspected read from the image-to-be-inspected memory device.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:提供一种用于检查被检查样品的图像的劣化的图案检查系统和图案检查方法,由此获得的被检查样品,以及用于管理被检查样品的方法。 ;解决方案:图案检查系统包括:光学图像获取部分,用于获取待检查样品的光学图像;参考图像存储设备,用于将待检查样品的光学图像存储为参考图像;待检查存储装置,其用于在获取基准图像之后由光学图像获取部获取待检查样本的光学图像,并将该光学图像存储为待检查图像;以及比较处理部,用于比较参考图像和要检查的图像。模式检查系统将从参考图像存储设备读取的待检查样品的参考图像与从待检查图像存储设备读取的待检查样品的检查图像进行比较。 (C)2007,日本特许厅&INPIT

著录项

  • 公开/公告号JP2007178144A

    专利类型

  • 公开/公告日2007-07-12

    原文格式PDF

  • 申请/专利权人 ADVANCED MASK INSPECTION TECHNOLOGY KK;

    申请/专利号JP20050373900

  • 发明设计人 MATSUMURA KENICHI;

    申请日2005-12-27

  • 分类号G01B11/24;G01N21/956;H01L21/027;G03F1/08;

  • 国家 JP

  • 入库时间 2022-08-21 21:15:48

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