MATERIAL FOR DEPOSITING THIN FILM, THIN FILM DEPOSITED USING THE SAME, AND METHOD FOR DEPOSITING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a material for depositing a thin film where a thin film having excellent heat resistance can be deposited while maintaining high reflectivity.;SOLUTION: The material for depositing a thin film has an Ag-based composition comprising 0.01 to 35 at% (atomic%) C. The material may further comprise at least one kind selected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Zr, Nb, Mo, Hf, Ta, W and Re, the group consisting of Ru, Rh, Pd, Ir, Pt and Au, and the group consisting of B, N, Al, Si, P, Ga, Ge, In, Sn, Sb, Mg, Te and Bi by 0.01 to 10 at%.;COPYRIGHT: (C)2007,JPO&INPIT