首页> 外国专利> METHOD OF FORMING GAS-BARRIER LAMINATED FILM FREE FROM HEAT-TREATMENT HISTORY

METHOD OF FORMING GAS-BARRIER LAMINATED FILM FREE FROM HEAT-TREATMENT HISTORY

机译:不受热处理历史影响的气体阻隔层状薄膜的形成方法

摘要

PROBLEM TO BE SOLVED: To provide an industrially prominent process for manufacturing a film material rich in gas barrier characteristic by resolving disadvantage of a gas barrier laminated film which is obtained by using a poly alcohol based resin, a poly carboxylic acid based resin and a metal compound in combination and has improved gas barrier characteristic by using ester bond and metallic ion cross-linking caused by heat-treatment, the disadvantage in which the deterioration or the deformation of the film base material, the heat degradation or the coloring of a gas barrier resin or a large consumption of energy or other problems due to a high temperature long term heat treatment are unavoidable.;SOLUTION: The gas barrier laminated film is formed by infiltrating a metallic compound aqueous solution to a laminated film without applying heat treatment thereto, the laminated film being formed by applying the poly carboxylic acid based resin for forming a gas barrier layer onto a film base material, and drying the film in a high humidity treating vessel where the aqueous solution containing a polyvalent metal compound is atomized, cleaning the film with a cleaning liquid if needed and drying the film to cross-link the poly carboxylic acid based resin with the metallic ion.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:通过解决使用聚乙烯醇系树脂,聚羧酸类树脂和金属获得的阻气性层压膜的缺点,提供一种工业上重要的方法来制造具有阻气性的薄膜材料。化合物结合使用,并通过使用酯键和热处理引起的金属离子交联而具有改善的阻气性,其缺点是薄膜基材的劣化或变形,阻气性的热降解或着色树脂,能源的大量消耗或由于高温长期热处理而引起的其他问题是不可避免的。解决方案:气体阻隔层压膜是通过将金属化合物水溶液渗入层压膜而不进行热处理而形成的,通过将用于形成气体阻隔层的聚羧酸基树脂涂覆到膜上而形成层压膜基材,并在将含有多价金属化合物的水溶液雾化的高湿度处理容器中干燥薄膜,必要时用清洁液清洁薄膜,然后干燥薄膜以使聚羧酸类树脂与聚合物交联。金属离子。;版权所有(C)2007,JPO&INPIT

著录项

  • 公开/公告号JP2007160302A

    专利类型

  • 公开/公告日2007-06-28

    原文格式PDF

  • 申请/专利权人 KUREHA CORP;

    申请/专利号JP20060305988

  • 申请日2006-11-10

  • 分类号B05D7/04;B05D5/00;B05D3/04;B32B27/00;B32B27/30;C09D201/08;C09D5/00;C09D201/06;C09D133/02;C09D135/00;B65D65/42;

  • 国家 JP

  • 入库时间 2022-08-21 21:13:55

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