HYDROPHILIC/HYDROPHOBIC PATTERNING APPARATUS AND HYDROPHILIC/HYDROPHOBIC PATTERNING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a hydrophilic/hydrophobic patterning apparatus or the like by which the hydrophilic/hydrophobic patterning is carried out rapidly and highly precisely and the cost burden with the hydrophilic/hydrophobic pattering is reduced.;SOLUTION: In the hydrophilic/hydrophobic patterning apparatus 1, the position of an irradiation port 29 of an UV irradiation head 9 is adjusted to the hydrophilic/hydrophobic pattern by controlling the angle and the traverse position of the UV irradiation head 9, The hydrophilic/hydrophobic apparatus 1 controls a moving mechanism 11 in the X direction, a moving mechanism 13 in the Y-direction and a rotation mechanism 15 in the θ-direction to carry out the relative positioning of a substrate 3 and the UV irradiation head unit 7. The hydrophilic/hydrophobic patterning apparatus 1 irradiates a prescribed position of a photo hydrophilic/hydrophobic film formed on the surface of the substrate 3 with UV light from the UV irradiation head 9. An area irradiated with the UV light is converted from hydrophilic/hydrophobic one to hydrophilic one and an area which is does not irradiated with the UV light is converted to hydrophobic one to form the hydrophilic/hydrophobic pattern.;COPYRIGHT: (C)2007,JPO&INPIT