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Also the measurement equipment and the method of being based on the principle of focus microscopic method

机译:也是基于聚焦显微法原理的测量设备和方法

摘要

The invention relates to a measuring device and a method based on a confocal microscopy principle. The inventive device comprises a light source (1), a diaphragm unit (3) for limiting a beam, an imagine optical system (4) for focusing the light (5) which is irradiated by said source on a measurable object (6) and passes through said diaphragm unit. Said device also comprises an optical system (10) for receiving the light (5) reflected from the object and passing through said optical system or another diaphragm unit disposed in an observation beam (7) and an image receiver (10) which is provided with at least two radiation-sensitive sensor elements (13, 14) (pixel). Said invention is characterized in that, in order to obtain the image of an altitude information-containing measurement, the device is also provided with means (11) for modifying the beam optical path length disposed between the light source (1) and/or the image receiver (10), on one side, and the object (6) on the other and the optical distance (d) of a focal point is modifiable in a predetermined manner. In addition, said intention makes it possible to influence the dependence of an accumulation of charges (Q13, Q14) in at least two sensor elements (13, 14) on the light intensity of the observation beam (7) during the exposure time in such a way that a correlation associated with the optical distance (d) of an image plane can be carried out by the imagine optical system (4), thereby making it possible to reconstitute the altitude co-ordinate (zs) of the object by distributing the intensity values obtained during the exposure time from at least two sensor elements (13, 14).
机译:基于共聚焦显微镜原理的测量设备和方法技术领域本发明涉及基于共聚焦显微镜原理的测量设备和方法。本发明的装置包括光源(1),用于限制光束的光阑单元(3),用于将由所述光源辐射的光(5)聚焦在可测量物体(6)上的想象光学系统(4),以及通过所述隔膜单元。所述设备还包括:光学系统(10),其用于接收从物体反射并穿过所述光学系统的光(5)或设置在观察光束(7)中的另一个光阑单元;以及图像接收器(10),其具有至少两个辐射敏感传感器元件(13、14)(像素)。该发明的特征在于,为了获得包含高度信息的测量的图像,该设备还设置有用于改变设置在光源(1)和/或光源之间的光束光路长度的装置(11)。一侧上的图像接收器(10),另一侧上的物体(6)以及焦点的光学距离(d)可以以预定方式修改。另外,所述意图使得可以在这样的曝光时间内影响至少两个传感器元件(13、14)中的电荷积累(Q13,Q14)对观察光束(7)的光强度的依赖性。一种方法,可以通过想象光学系统(4)进行与像平面的光学距离(d)相关的相关性,从而可以通过分布物体的高度坐标(zs)来重构物体的高度坐标(zs)。在曝光期间从至少两个传感器元件(13、14)获得的强度值。

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