OPTICAL THIN FILM FORMING DEVICE LOADED WITH FILM THICKNESS MEASURING DEVICE, AND OPTICAL THIN FILM FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To solve a problem created by the fact that a film thickness control method when preparing an NBPF is different from an evaluation method after the NBPF is prepared, in a conventional NBPF manufacturing process.;SOLUTION: Spectroscopic characteristics in various film thicknesses of respective layers are calculated beforehand as theoretical values based on a film design for acquiring a desired optical characteristic, and measuring light projected to a film formation substrate is wavelength-swept in order to control the film thickness by comparing successively the theoretical values with a measured value of the spectroscopic characteristic in the film formation, and the spectroscopic characteristic of the film formation substrate is measured. Specifically, this device is equipped with a wavelength variable laser for wavelength-sweeping of the measuring light projected to the film formation substrate; a spectroscopic characteristic measuring photodetector for receiving the light transmitted through or reflected by the film formation substrate, and photoelectrically converting and outputting the received light synchronously with wavelength sweeping of a wavelength variable laser; an optical power meter for measuring and outputting a transmittance or a reflectance of the film formation substrate synchronously with output from the spectroscopic characteristic measuring photodetector; and a computer for reading the spectroscopic characteristic of the film formation substrate from the transmittance or the reflectance output from the optical power meter, and comparing it with a theoretical value. A procedure for selecting alternatively a monochromatic measuring method or a spectroscopic characteristic method is also provided.;COPYRIGHT: (C)2007,JPO&INPIT