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SURFACE COATED CUTTING TOOL MADE OF CUBIC BORON NITRIDE-BASE ULTRA-HIGH PRESSURE SINTERED MATERIAL HAVING HARD COATED LAYER EXHIBITING CHIPPING RESISTANCE IN HIGH-SPEED HEAVY CUTTING OF HIGH-HARDNESS STEEL
SURFACE COATED CUTTING TOOL MADE OF CUBIC BORON NITRIDE-BASE ULTRA-HIGH PRESSURE SINTERED MATERIAL HAVING HARD COATED LAYER EXHIBITING CHIPPING RESISTANCE IN HIGH-SPEED HEAVY CUTTING OF HIGH-HARDNESS STEEL
PROBLEM TO BE SOLVED: To provide a surface coated cutting tool made of cubic boron nitride-base ultra-high pressure sintered material having a hard coated layer exhibiting chipping resistance in high-speed heavy cutting of high-hardness steel.;SOLUTION: In this surface coated cutting tool made of cubic boron nitride-base ultra-high pressure sintered material, a hard coated layer is formed by vapor deposition on the surface of an ultra-high pressure sintered material-made insert containing 30 to 95 mass% boron nitride. (a) The hard coated layer includes a lower layer having an average layer thickness ranging from 1.5 to 6 μm, and an upper layer having an average layer thickness ranging from 0.3 to 3 μm. (b) The lower layer is formed of a deposited composite nitride layer of Cr and Si satisfying the composition formula [Cr1-XSiX]N (wherein X indicates 0.02 to 0.1 by atomic ratio), and (c) the upper layer has an alternately stacking structure of a thin layer A and a thin layer B, both of which have an average layer thickness per layer ranging from 0.01 to 0.3 μm. The thin layer A is formed of a composite nitride layer of Cr and Si satisfying [Cr1-XSiX]N (wherein X indicates 0.02 to 0.1 by atomic ratio) and the thin layer B is formed of a chrome nitride (CrN) layer.;COPYRIGHT: (C)2007,JPO&INPIT
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机译:解决的问题:提供一种由立方氮化硼基超高压烧结材料制成的表面涂层切削工具,该材料具有硬涂层,在高硬度钢的高速重切削中具有抗崩刃性。在以立方氮化硼基超高压烧结材料制成的表面涂覆切削工具的基础上,通过气相沉积在包含30至95质量%氮化硼的超高压烧结材料制成的刀片表面上形成硬涂层。 (a)硬涂层包括具有平均层厚度在1.5至6μm范围内的下层和具有平均层厚度在0.3至3μm范围内的上层。 (b)下层由满足组成式[Cr 1-X Sub> Si X Sub>] N的Cr和Si的沉积复合氮化物层形成,其中X表示0.02 (c)上层具有薄层A和薄层B的交替堆叠结构,它们每层的平均层厚度都在0.01至0.3μm的范围内。薄层A由满足[Cr 1-X Sub> Si X Sub>] N(其中X表示原子比为0.02至0.1)的Cr和Si的复合氮化物层形成。薄层B由氮化铬(CrN)层形成。; COPYRIGHT:(C)2007,JPO&INPIT
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