DETECTION METHOD OF GLASS SUBSTRATE FILM THICKNESS AND METHOD FOR FORMING THIN FILM OF GLASS SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method for detecting reaching of a predetermined film thickness when reaching a thickness of several micro meters from surface in forming a glass thin film, and also to provide a method for forming a thin film of glass substrate to the predetermined film thickness.;SOLUTION: This detection method is to detect reaching of the thin film forming processed surface to a porous structure by a change in the thin film forming processed surface when the thin film forming processed surface reaches the porous structure by performing a thin film forming process after forming the porous structure from surface of one side of a glass substrate to the predetermined film thickness by electron irradiation. This thin film forming method is to form a thin film of glass substrate to the predetermined film thickness using the detection method and to analyze foreign matter attached to the glass substrate surface from the glass surface side. The thin film forming method is to form a thin film of glass substrate till exposure of surface contacting of the foreign matter to the glass substrate by ion etching after forming the porous structure to the predetermined thickness from the surface attached with the foreign matter of the glass substrate by electron irradiation and forming the thin film to the predetermined film thickness using the detection method.;COPYRIGHT: (C)2007,JPO&INPIT