首页> 外国专利> MANUFACTURING METHOD OF POLARIZATION DIFFRACTION ELEMENT, AND POLARIZATION DIFFRACTION ELEMENT OR HOLOGRAM ELEMENT OBTAINED BY THE MANUFACTURING METHOD

MANUFACTURING METHOD OF POLARIZATION DIFFRACTION ELEMENT, AND POLARIZATION DIFFRACTION ELEMENT OR HOLOGRAM ELEMENT OBTAINED BY THE MANUFACTURING METHOD

机译:极化衍射元件的制造方法,以及由该制造方法获得的极化衍射元件或全息图元件

摘要

PROBLEM TO BE SOLVED: To provide a polarization diffraction element or a polarization hologram element by a simple manufacturing method.;SOLUTION: A birefringence-inducing part and a part having no birefringence are formed into a grid shape by irradiating a coating film of birefringence-inducing material with polarizing ultraviolet light by the use of a method such as grid-like mask or two-beam interferometry. In the diffraction grating or the hologram element thus manufactured, a periodic structure of refractive index is produced in either refractive index in the parallel direction with respect to the grating or refractive index in the vertical direction with respect to the grating and, in the direction vertical to the above mentioned direction, the periodic structure of refractive index is not exhibited. As the result, the polarization diffraction grating can be provided.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:通过简单的制造方法提供偏振衍射元件或偏振全息图元件。解决方案:通过照射双折射的涂膜,将引起双折射的部分和没有双折射的部分形成为格子状。通过使用诸如栅格状掩模或两光束干涉法之类的方法使偏振光诱导材料。在这样制造的衍射光栅或全息元件中,在相对于光栅的平行方向上的折射率或相对于光栅的垂直方向上的折射率以及在垂直方向上的折射率产生周期性的折射率结构。在上述方向上,没有表现出折射率的周期性结构。结果,可以提供偏振衍射光栅。;版权所有:(C)2007,日本特许厅

著录项

  • 公开/公告号JP2007052144A

    专利类型

  • 公开/公告日2007-03-01

    原文格式PDF

  • 申请/专利权人 HAYASHI TELEMPU CO LTD;

    申请/专利号JP20050236203

  • 申请日2005-08-17

  • 分类号G02B5/18;G02B5/32;G02B5/30;G11B11/105;G11B7/135;

  • 国家 JP

  • 入库时间 2022-08-21 21:11:33

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