首页> 外国专利> MULTILAYER THIN FILM, METHOD OF MANUFACTURING THIN FILM TRANSISTOR HAVING MULTILAYER THIN FILM AND THIN FILM TRANSISTOR DISPLAY PANEL

MULTILAYER THIN FILM, METHOD OF MANUFACTURING THIN FILM TRANSISTOR HAVING MULTILAYER THIN FILM AND THIN FILM TRANSISTOR DISPLAY PANEL

机译:多层薄膜,具有多层薄膜和薄膜晶体管显示面板的制造薄膜晶体管的方法

摘要

PROBLEM TO BE SOLVED: To improve the characteristics of a thin film transistor and the performance of a display device.;SOLUTION: A polycrystalline silicon film 42 is formed on a substrate 41, and an insulated film 43 having a contact hole 44 exposing the surface of the polycrystalline silicon film is formed on that. On the insulated film, a gate line having an amorphous silicon film 45 and a conductive film 46 is formed, and is connected with the polycrystalline silicon film 42 through the contact hole. Moreover, the insulated film and a data line are formed on the gate line. Thus, the amorphous silicon film 45 is provided to diversify lateral inclination, and the substrate is annealed to improve the adhesive strength between the conductive film 46 and the amorphous silicon film 45. Thereby, contact resistance can be reduced, and the characteristics and reliability of the thin film transistor are improved.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:为了改善薄膜晶体管的特性和显示装置的性能。解决方案:在衬底41上形成多晶硅膜42,并且绝缘膜43具有暴露表面的接触孔44。在其上形成多晶硅膜的一部分。在绝缘膜上,形成具有非晶硅膜45和导电膜46的栅极线,并通过接触孔与多晶硅膜42连接。此外,绝缘膜和数据线形成在栅极线上。因此,提供非晶硅膜45以使横向倾斜度多样化,并且对基板进行退火以提高导电膜46和非晶硅膜45之间的粘合强度。由此,可以降低接触电阻,并且可以降低接触电阻的特性和可靠性。改进了薄膜晶体管。;版权所有:(C)2007,JPO&INPIT

著录项

  • 公开/公告号JP2006319305A

    专利类型

  • 公开/公告日2006-11-24

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO LTD;

    申请/专利号JP20050371876

  • 发明设计人 RYU SHUNKI;JUNG JIN-GOO;

    申请日2005-12-26

  • 分类号H01L29/786;H01L21/768;H01L29/417;

  • 国家 JP

  • 入库时间 2022-08-21 21:11:25

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