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MASK SUBSTRATE, AND LASER BEAM DICING DEVICE AND METHOD

机译:面具基质和激光束切割装置及方法

摘要

PPROBLEM TO BE SOLVED: To deter irradiation of a laser beam to a region other than the prescribed region of an object of laser beam machining and also to surely reform the prescribed region of the object of laser beam machining. PSOLUTION: A mask substrate M has a prescribed opening part M1 where the laser beam to be condensed can be passed through. The width of a laser beam emitting port M2 of the opening part M1 is relatively narrow and the width of the leaser beam incident port M3 of the opening part M1 is relatively wide. PCOPYRIGHT: (C)2007,JPO&INPIT
机译:

要解决的问题:阻止激光束照射到除激光加工对象的规定区域以外的区域,并且还确定地改造激光加工对象的规定区域。

解决方案:掩模基板M具有规定的开口部分M1,待会聚的激光束可以穿过该开口部分。开口部分M1的激光束发射端口M2的宽度相对较窄,并且开口部分M1的激光束入射端口M3的宽度相对较宽。

版权:(C)2007,日本特许厅&INPIT

著录项

  • 公开/公告号JP2007030002A

    专利类型

  • 公开/公告日2007-02-08

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20050218384

  • 发明设计人 YAMAZAKI YUTAKA;UMETSU KAZUNARI;

    申请日2005-07-28

  • 分类号B23K26/06;B23K26/38;B23K26/40;

  • 国家 JP

  • 入库时间 2022-08-21 21:10:34

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