首页> 外国专利> FILM DEPOSITION METHOD, PIEZOELECTRIC FILM FORMED BY THE FILM DEPOSITION METHOD, PIEZOELECTRIC ELEMENT WITH THE PIEZOELECTRIC FILM, AND INK JET APPARATUS USING THE PIEZOELECTRIC ELEMENT

FILM DEPOSITION METHOD, PIEZOELECTRIC FILM FORMED BY THE FILM DEPOSITION METHOD, PIEZOELECTRIC ELEMENT WITH THE PIEZOELECTRIC FILM, AND INK JET APPARATUS USING THE PIEZOELECTRIC ELEMENT

机译:膜沉积方法,由膜沉积方法制成的压电膜,具有压电膜的压电元件以及使用该压电元件的喷墨装置

摘要

PROBLEM TO BE SOLVED: To easily deposit a film of a desired pattern without using a mask or the like in a film deposition method using an aerosol deposition method.;SOLUTION: Particles are jetted toward a base body surface to deposit a film made of a material constituting the particle. This film deposition method comprises: a process of preparing a substrate having a surface equipped with at least two regions different in material depositing rate; and a process of selectively depositing the film containing a film-forming material on the region of larger coarseness of the two regions by jetting many particles containing the film depositing material onto the surface.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:在使用气溶胶沉积法的膜沉积方法中,不使用掩模等就可以容易地沉积所需图案的膜。;解决方案:向基体表面喷射颗粒,以沉积由铝制成的膜。构成粒子的材料。该成膜方法包括:准备表面具有至少两个材料沉积率不同的区域的表面的基板的工序。通过将许多包含成膜材料的薄膜喷射到表面上的方法,在两个区域的较大粗糙度区域上选择性地沉积包含成膜材料的薄膜的方法。版权所有:(C)2007,JPO&INPIT

著录项

  • 公开/公告号JP2006326523A

    专利类型

  • 公开/公告日2006-12-07

    原文格式PDF

  • 申请/专利权人 CANON INC;

    申请/专利号JP20050155530

  • 申请日2005-05-27

  • 分类号B05D1/02;C23C28/00;B41J2/045;B41J2/055;H01L41/24;H01L41/187;H01L41/09;C23C24/04;

  • 国家 JP

  • 入库时间 2022-08-21 21:09:58

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