Preliminary vacuum chamber and vacuum processing apparatus using the same

摘要

PROBLEM TO BE SOLVED: To provide a pre-vacuum chamber permitting the gate to be lessened and treating apparatus having a pre-vacuum chamber, and provide a chamber capable of switching over an at atmospheric air state and vacuum state for a short time and treating apparatus using the same. ;SOLUTION: A frame 30 constituting a pre-vacuum chamber an opening for carrying a semiconductor wafer in or from the frame 30 in which wafer holders 33a', 33b for holding a wafer W are provided. By moving mechanisms 39a, 39b the wafer holders are moved to form closed spaces 32a', 32b defined by protrusions 31a', 31b of the frame 30 and wafer holders 33a', 33b. By introducing a gas in the closed space 32b the wafer W is cooled and the wafer W is heated in the closed space 32a' by a heater 1.;COPYRIGHT: (C)1999,JPO