The electronic device which was formed impurity introduction method, making use of the impurity introduction device and these

摘要

Topic of this invention actualizes impurity introduction without causing the rise of baseplate temperature. In order to become optimum to the process which measures the physical properties of the lattice defect which it is possible with impurity introduction process optically, continues, it is to control. Adjusting to the optical quality of the territory where the aforementioned impurity is introduced on the basis of process and the aforementioned measurement result which measure the optical quality of the territory where process and the aforementioned impurity which introduce the impurity into the solid base substance surface are introduced, the process which the territory where the aforementioned impurity is introduced with the process which selects annealing condition and on the basis of the aforementioned annealing condition which is selected annealing is done it includes.