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Polymer, top coating layer, top coating composition and immersion lithography process using the same
Polymer, top coating layer, top coating composition and immersion lithography process using the same
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机译:聚合物,面漆层,面漆组合物和使用其的浸没式光刻工艺
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摘要
A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are provided. The polymer used as a top coating layer covering (or formed on) a photoresist may include a specific chemical structure. The top coating composition may include a solvent and a polymer of having the specific chemical structure. The immersion lithography process includes forming a photoresist layer on a wafer, forming a top coating layer on the photoresist layer, immersing the wafer in water, performing an exposure process on the photoresist layer and forming a photoresist pattern by removing the top coating layer and the photoresist layer with a developer.
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