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Energy conversion and storage films and devices by physical vapor deposition of titanium and titanium oxides and sub-oxides
Energy conversion and storage films and devices by physical vapor deposition of titanium and titanium oxides and sub-oxides
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机译:通过物理气相沉积钛以及钛氧化物和亚氧化物的能量转换和存储膜及装置
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摘要
High density oxide films are deposited by a pulsed-DC, biased, reactive sputtering process from a titanium containing target to form high quality titanium containing oxide films. A method of forming a titanium based layer or film according to the present invention includes depositing a layer of titanium containing oxide by pulsed-DC, biased reactive sputtering process on a substrate. In some embodiments, the layer is TiO2. In some embodiments, the layer is a sub-oxide of Titanium. In some embodiments, the layer is TixOy wherein x is between about 1 and about 4 and y is between about 1 and about 7. In some embodiments, the layer can be doped with one or more rare-earth ions. Such layers are useful in energy and charge storage, and energy conversion technologies.
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机译:通过脉冲直流,偏置,反应溅射工艺从含钛靶材上沉积高密度氧化膜,以形成高质量的含钛氧化膜。根据本发明的形成钛基层或膜的方法包括通过脉冲DC,偏压反应溅射法在基板上沉积含钛的氧化物层。在一些实施方案中,该层是TiO 2 Sub>。在一些实施例中,该层是钛的次氧化物。在一些实施例中,该层是Ti x Sub> O y Sub>,其中x在大约1至大约4之间,并且y在大约1至大约7之间。在一些实施例中,该层可以掺杂一种或多种稀土离子。这样的层可用于能量和电荷存储以及能量转换技术。
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