METHOD AND APPARATUS OF RAPID DETERMINATION OF PROBLEMATIC AREAS IN VLSI LAYOUT BY ORIENTED SLIVER SAMPLING

摘要

A method and system for identifying problematic areas in a very large scale integrated (VLSI) layout. The method and system includes defining one or more sample area and overlaying the one or more sample area onto at least a portion of a layout having a plurality of structures. The method and system includes identifying at least one region of the layout in the sample area which has at least one structure which satisfies a predetermined value. In embodiments, the method and system can be implemented on a computer program product comprising a computer useable medium including a computer readable program.