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Double metal collimated photo masks, diffraction gratings, optics system, and method related thereto
Double metal collimated photo masks, diffraction gratings, optics system, and method related thereto
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机译:双金属准直光掩模,衍射光栅,光学系统及其相关方法
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摘要
A photo mask having at least 2 mask pattern layers disposed to collimate light patterns passing through the mask. An improved optical photo lithographic system utilizing light collimating photo masks to improve resolution, depth of focus and field size. A method of manufacturing integrated circuit chips utilizing light collimating photo mask technology.
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