METHOD OF MANUFACTURING METAL MASK AND METAL MASK, AND METHOD OF MANUFACTURING HIGH ASPECT RATIO DIFFRACTION GRATING AND HIGH ASPECT RATIO DIFFRACTION GRATING

摘要

The present invention addresses the problem of providing a method of manufacturing a metal mask that has resistance against etching and a metal mask obtained thereby, and a method of manufacturing a high aspect ratio diffraction grating that has high resolution using the metal mask and a high aspect ratio diffraction grating obtained thereby. This method of manufacturing a metal mask is characterized by manufacturing a metal mask by forming an aluminum layer on a silicon substrate, patterning the aluminum layer, etching the silicon substrate that corresponds to the region from which the aluminum layer has been removed to form a grating having an uneven structure, filling recesses of the grating with an organic material and solidifying the same to form an etching resist, removing the organic material by an etching method except from bottom portions of the recesses, metal plating the top surface and side surface from which the organic material has been removed, and removing the organic material remaining in the bottom portions of the recesses.