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Silver barrier layers to minimize whisker growth in tin electrodeposits

机译:银阻挡层可最大程度地减少锡电沉积中的晶须生长

摘要

The invention relates to a method of reducing tin whisker formation in a plated substrate that includes a surface layer comprising tin. The method includes providing on electroplatable portions of the substrate (a) an underlayer comprising silver or (b) a barrier layer that passes a mechanical load test when the surface layer, after 48 hours of contact with a 1 mm hemispherical tip that carries a load of between 500 to 2000 g, exhibits no whiskers having a length of greater than 5 microns. The underlayer or barrier layer, whichever is present, is provided in a thickness sufficient to prevent formation of intermetallic compounds between the substrate and surface layer so that the surface layer exhibits reduced whisker formation compared to the same surface layer deposited directly upon the substrate. Typically, the underlayer or barrier layer includes 50 to 100% by weight silver or similar ductile material.
机译:本发明涉及一种减少在包括具有锡的表面层的镀覆基板中锡晶须形成的方法。该方法包括在衬底的可电镀部分上提供(a)包含银的底层或(b)阻挡层,当该表面层与承载负载的1 mm半球形尖端接触48小时后,该阻挡层通过机械负载测试在500至2000g之间的α,没有显示出长度大于5微米的晶须。底层或阻挡层,无论存在与否,其厚度应足以防止在基材和表面层之间形成金属间化合物,从而与直接沉积在基材上的相同表面层相比,该表面层的晶须形成减少。通常,底层或阻挡层包括50至100重量%的银或类似的韧性材料。

著录项

  • 公开/公告号US2006292847A1

    专利类型

  • 公开/公告日2006-12-28

    原文格式PDF

  • 申请/专利权人 ROBERT A. SCHETTY;

    申请/专利号US20060473401

  • 发明设计人 ROBERT A. SCHETTY;

    申请日2006-06-23

  • 分类号H01L21/66;H01L21/44;

  • 国家 US

  • 入库时间 2022-08-21 21:03:12

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