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Method of manufacturing a mask blank and a mask, the mask blank and the mask, and useless film removing method and apparatus

机译:掩模坯料和掩模的制造方法,掩模坯料和掩模以及无用的膜去除方法和装置

摘要

In a method of removing a useless film formed along a circumferential portion of a substrate, so as to provide a removed portion, a cover member is covered over the substrate to supply a solvent to the useless portion through solvent supply holes. The circumferential portion which has the removed portion and a non-removed portion serves to provide an identification code or the like for identifying the substrate. The solvent supply holes are formed in a solvent guide member which is exchangeably attached to a peripheral portion of the cover member. The substrate may be either a mask blank or a mask that has the identification pattern formed by removing the useless film by the above-mentioned method.
机译:在去除沿基板的周向部分形成的无用膜以提供去除部分的方法中,覆盖构件被覆盖在基板上以通过溶剂供应孔将溶剂供应到无用部分。具有去除部分和未去除部分的圆周部分用于提供用于识别基板的识别码等。溶剂供应孔形成在溶剂引导构件中,该溶剂引导构件可交换地附接到盖构件的外围部分。基板可以是掩模坯料,也可以是具有通过上述方法去除无用的膜而形成的识别图案的掩模。

著录项

  • 公开/公告号US7226705B2

    专利类型

  • 公开/公告日2007-06-05

    原文格式PDF

  • 申请/专利权人 MITSUAKI HATA;

    申请/专利号US20020255706

  • 发明设计人 MITSUAKI HATA;

    申请日2002-09-27

  • 分类号G03F1/00;G03C5/00;

  • 国家 US

  • 入库时间 2022-08-21 21:00:32

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