Laser depilating method and laser depilating apparatus

摘要

A laser depilating method for depilating treatment by irradiating a skin surface with a laser beam emitted from a semiconductor laser. A treatment region of the skin surface is treated with a semiconductor laser beam for an irradiation time of 100 msec or more per irradiation while controlling the laser beam so that the energy density when irradiating the skin surface may be in a range of 0.01–1 J/mm². Irradiation of the skin surface with a semiconductor laser beam under such a condition provides a more secure and efficient treatment effect of laser depilation. A plurality of semiconductor laser beams are used as necessary to irradiate a wider area of skin surface at a time.