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Antireflective coatings with increased etch rates
Antireflective coatings with increased etch rates
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机译:增透率高的抗反射涂层
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摘要
The present invention provides new light absorbing compositions suitable for use as an antireflective coating (“ARC”) with an overcoated resist layer. ARCs of the invention exhibit increased etch rates in standard plasma etchants. Preferred ARCs of invention have significantly increased oxygen content relative to prior compositions.
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