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Layout method of semiconductor integrated circuit, layout structure thereof, and photomask for forming the layout structure
Layout method of semiconductor integrated circuit, layout structure thereof, and photomask for forming the layout structure
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机译:半导体集成电路的布局方法,其布局结构以及用于形成布局结构的光掩模
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摘要
A plurality of standard cells 10 are arranged to form a channel-less standard cell array 1, which has vertical and horizontal sides. A plurality of first proximity dummy cells 20 are arranged along each of the vertical sides of the standard cell array to form a first proximity dummy bands 20 such that the upper and lower sides of the first proximity dummy cells are in contact with each other and such that the left or right side of each of the first proximity dummy cells is in contact with the vertical side of the standard cell array 1. Furthermore, a plurality of second proximity dummy bands are arranged along each of the horizontal sides of the standard cell array to form a second proximity dummy bands such that the upper or lower side of each of the second proximity dummy cells is in contact with the horizontal side of the standard cell 1. 展开▼