首页> 外国专利> FILM WITH SUPERIOR IMPACT RESISTANCE AND IMPROVED CATASTROPHIC FAILURE RESISTANCE UNDER HIGH STRAIN RATE

FILM WITH SUPERIOR IMPACT RESISTANCE AND IMPROVED CATASTROPHIC FAILURE RESISTANCE UNDER HIGH STRAIN RATE

机译:在高应变率下具有优异的耐冲击性和改善的灾难性耐破坏性的薄膜

摘要

Abstract Stretch films which exhibit good puncture and impact resistance while also exhibiting resistance to defect propagation are desired. The films of the present invention have an ultimate stretch of at least 200 percent, a dart impact strength of at least about 700 gms/mil and a catastrophic failure stretch of at least 95 percent of the elongation to break value (CF of 5 or less). The films preferably comprise at least 3 layers and preferably comprise at least 50 percent by weight of polyethylene polymers.
机译:摘要期望具有良好的抗穿刺性和抗冲击性同时还具有对缺陷传播的抵抗性的拉伸膜。本发明的膜具有至少200%的极限拉伸,至少约700gms / mil的落镖冲击强度和至少95%的断裂伸长率(CF为5或更小)的灾难性破坏拉伸。 )。该膜优选包含至少3层,并且优选包含至少50重量%的聚乙烯聚合物。

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