首页> 外国专利> METHOD AND APPARATUS FOR SUPPRESSION OF SPATIAL-HOLE BURNING IN SECOND OR HIGHER ORDER DFB LASERS

METHOD AND APPARATUS FOR SUPPRESSION OF SPATIAL-HOLE BURNING IN SECOND OR HIGHER ORDER DFB LASERS

机译:抑制二阶或更高阶DFB激光中的空洞燃烧的方法和装置

摘要

A surface emitting semiconductor laser is shown having a semiconductor laser structure (10) defining an intrinsic cavity having an active layer (22), opposed cladding layers contiguous to said active layer (22), a substrate (17) and electrodes (12, 14) by which current can be injected into said semiconductor laser structure (10) to cause said laser structure to emit an output signal in the form of at least a surface emission. The intrinsic cavity is configured to have a dominant mode on a longer wavelength side of a stop band. A structure such as a buried heterostructure for laterally confining an optical mode is included. A second order distributed diffraction grating (24) is associated with the intrinsic cavity, the diffraction grating (24) having a plurality of grating elements (27, 28) having periodically alternating optical properties when said current is injected into said laser structure. The grating is sized and shaped to generate counter-running guided modes within the intrinsic cavity wherein the grating (24) has a duty cycle of greater than 50% and less than 90%. Also provided is a means for shifting a phase (26) of said counter-running guided modes within the cavity to alter a mode profile to increase a near field intensity of said output signal.
机译:示出了具有半导体激光器结构(10)的表面发射半导体激光器,该半导体激光器结构限定了本征腔,该本征腔具有有源层(22),与所述有源层(22)相邻的相对的包层,衬底(17)和电极(12、14) ),通过该电流可以将电流注入所述半导体激光器结构(10),以使所述激光器结构发射至少表面发射形式的输出信号。本征腔被配置为在阻带的较长波长侧具有主导模式。包括诸如用于横向限制光学模式的掩埋异质结构的结构。二阶分布衍射光栅(24)与本征腔相关,该衍射光栅(24)具有多个光栅元件(27、28),当将所述电流注入所述激光器结构时,所述光栅元件具有周期性交替的光学特性。光栅的尺寸和形状设计成在本征腔内产生反向运行的导模,其中光栅(24)的占空比大于50%且小于90%。还提供了一种用于在腔内移动所述反向运行的引导模式的相位(26)以改变模式轮廓以增加所述输出信号的近场强度的装置。

著录项

  • 公开/公告号IN2006DN00135A

    专利类型

  • 公开/公告日2007-08-24

    原文格式PDF

  • 申请/专利权人

    申请/专利号IN135/DELNP/2006

  • 申请日2006-01-09

  • 分类号H01S5/40;H01S5/42;H01L33/00;H01S5/227;H01S5/65;H01S5/12;H01S5/187;

  • 国家 IN

  • 入库时间 2022-08-21 20:57:59

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号