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SYSTEM FOR INSPECTING WAFERS IN A LASER MARKING SYSTEM WITH AN ILLUMINATION SYSTEM ILLUMINATING A SURFACE OF THE WAFER AT ANGLE BETWEEN 45° AND 70° WITH RESPECT TO THIS SURFACE
SYSTEM FOR INSPECTING WAFERS IN A LASER MARKING SYSTEM WITH AN ILLUMINATION SYSTEM ILLUMINATING A SURFACE OF THE WAFER AT ANGLE BETWEEN 45° AND 70° WITH RESPECT TO THIS SURFACE
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机译：激光标记系统中的晶圆检查系统，其中照明系统以相对于该表面45°和70°的角度照亮晶圆表面
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摘要
An illumination system (60, 62) is disclosed for use in a semiconductor wafer back side inspection assembly (40). The illumination system (60, 62) includes an illumination source (60, 62) that is configured to direct illumination toward a highly reflective and directionally reflective surface (58) at an angle alpha of 45 degrees to 75 degrees with respect to the surface (58).
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