ELECTRO-OPTIC DEVICE SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME, ELECTRO-OPTIC DEVICE AND METHOD FOR MANUFACTURING THE SAME, PHOTOMASK, AND ELECTRONIC DEVICE

摘要

The present invention is obtaining a reflecting layer having a preferable light-scattering effect by a simple manufacturing process, the photomask (7a) is used for an exposure process for the process region 511 of the film 51 with a rough surface (粗 面) do. The exposure mask (7a) has a first region 71 and second region 72. The first portion 71 of the function as a transparent portion (81) for transmitting light toward the periphery of the process region 511. On the other hand, the second region 72 has a shielding portion that shields the light traveling toward the process region 511, 84 includes a plurality of dot regions 721 formed on each, and also directed to the process region 511 the semi-light transmitting portion 86 for transmitting by the lower light transmittance than the to-light portion 81 is provided in a region other than the dot regions 721.