Multi Magnetized Inductively Coupled Plasmas Structure

摘要

The present invention relates to a multiple- antenna structure , the configuration is located for each of the plurality of windows , the in many of the high-frequency antenna and the plasma processing apparatus for performing a predetermined process on a target substrate using a plasma gas flowing inside the vacuum chamber perpendicular to the window , the high frequency antenna is a window above the at least one at least relates to a multiple antenna structure that allows the position . ; the present invention , by a multi-antenna are each configured to have a different polarity , the effect that can prevent the eddy current is generated in the frame for supporting the window there is .