首页>
外国专利>
FORMATION METHODS OF InGaN NITRIDE LAYER AND MULTI-QUANTUM WELL STRUCTURE ACTIVE LAYER
FORMATION METHODS OF InGaN NITRIDE LAYER AND MULTI-QUANTUM WELL STRUCTURE ACTIVE LAYER
展开▼
机译:InGaN氮化物层和多量子阱结构有源层的形成方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention relates to a method for growing InGaN nitride layer including an active layer of multiple quantum well structure , In x Ga 1 -x N (0 & x 1) in the step of growing a gallium nitride layer a constant amount of the source and the indium source maintain , and provides dimethyl hydrazine (DMHy) InGaN nitride layer forming method , characterized by controlling the amount of indium in the nitride layer by adjusting the feed rate of the gas as the nitrogen source .
展开▼
机译:本发明涉及一种用于生长包括具有多量子阱结构的有源层In In x Sub> Ga 1 Sub> -x Sub> N的InGaN氮化物层的方法。 (0& x 1)在生长氮化镓层的步骤中保持恒定量的源和铟源,并提供二甲基肼(DMHy)InGaN氮化物层的形成方法,其特征在于控制铟中铟的含量通过调节作为氮源的气体的进料速率来形成氮化层。
展开▼