DEPOSITION BY MAGNETRON CATHODIC PULVERIZATION IN A PULSED MODE WITH PREIONIZATION

摘要

The method involves vaporizing a material, by magnetron cathode sputtering, using a gas. The gas is ionized in pulsed rate by applying main voltage pulse on a magnetron cathode (CM) of a magnetron reactor (1), where the gas is pre-ionized before each main voltage pulse. The gas is pre-ionized by applying a pre-ionization voltage on the cathode, where the pre-ionization voltage is continuous. An independent claim is also included for a magnetron reactor.