METHOD FOR PATTERNING POLY(DIMETHYLSILOXANE) STAMP USING UV

摘要

A method for patterning poly(dimethylsiloxane) stamp by using UV is provided to uniformly form diverse patterns on a variety of substrates in a short time. The method for patterning a poly(dimethylsiloxane) stamp by using UV comprises the steps of: (a) preparing a poly(dimethylsiloxane)(PDMS) stamp(3) from a master; (b) irradiating UV(254 nm) on a substrate(4) using the PDMS stamp(3) so as to form PDMS patterns; and (c) performing selective thin film deposition or wet-etching using PDMS patterns as a template. In the method, the deposition of thin film in the step(c) is performed by an atomic layer deposition, and the thin film is a thin film of titanium dioxide.