AR SPUTTERING APPARATUS FOR FABRICATING COPPER NANORODS AND NANOPARTICELS

摘要

An apparatus for manufacturing nanoparticles and nanorods is provided to produce copper nanoparticles and nanorods in a simple and easy method using an argon sputtering device. An apparatus for manufacturing nanoparticles and nanorods includes: a sputtering device which mounts a copper substrate in a vacuum chamber, ionizes argon gas to form argon plasma, and makes the argon plasma collide with the copper substrate to prepare copper nanoparticles and nanorods; a device for controlling the flux and pressure of argon gas in the sputtering device; and a device for controlling the temperature, position, and argon gas-colliding angle of the copper substrate.