FLUORINATED ORGANOSILANE COMPOUND FOR PRODUCING MOLD USED FOR REPLICATING PATTERNS, ORGANIC-INORGANIC HYBRID MOLD FOR PATTERN REPLICATION PRODUCED BY USING THE SAME, METHOD OF REPLICATION OF PATTERN USING THE MOLD AND PATTERN REPLICATED BY THE METHOD

摘要

Fluorinated organosilane compound for pattern replicating mold and organic-inorganic hybrid mold for the pattern replication are provided to obtain the mold with desired level of strength without alternative surface treatment using a releasing agent, and be employed in nano-implanting process and soft lithography by adding fluorinated organosilane compound to the mold. The compound includes fluorinated linear or branched chain alkyl, phenyl, phenylalkoxy or amine group and is formed by using silicon compounds, as starting material, represented by specific formula, for example, the formula(1) of (OR^1)nSi-R^2m, wherein: R1 is hydrogen or linear or branched chain alkyl group having carbon atoms ranging from 1 to 15; R2 is fluorinated linear or branched chain alkyl, phenyl, phenylalkoxy or amine group having carbon atoms ranging from 1 to 15; n is natural number of 1 to 3, m is natural number of 1 to 3 and n + m is 4. The organic-inorganic hybrid mold comprises a layer containing the organosilane compound and has reverse-master patterns on surface of the organosilane compound containing layer.