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POLISHING SHEET, SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD

机译:抛光片,基体抛光装置和基体抛光方法

摘要

substrate polishing concept ( apparatus and method ) is disclosed , the polishing surface of the polishing sheet by a drive device driven in the linear direction, the surface of the substrate is held on the polishing surface of the polishing sheet by a polishing head , the substrate is checked through the polishing sheet by a monitoring system .
机译:公开了一种基板抛光的概念(装置和方法),通过沿直线方向驱动的驱动装置对抛光片的抛光表面进行抛光,通过抛光头将基板的表面保持在抛光片的抛光表面上,通过监控系统对抛光片进行检查。

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