首页> 外国专利> FIN FIELD EFFECT TRANSISTOR MEMORY CELL, FIN FIELD EFFECT TRANSISTOR MEMORY CELL ARRANGEMENT, AND METHOD FOR THE PRODUCTION OF A FIN FIELD EFFECT TRANSISTOR MEMORY CELL

FIN FIELD EFFECT TRANSISTOR MEMORY CELL, FIN FIELD EFFECT TRANSISTOR MEMORY CELL ARRANGEMENT, AND METHOD FOR THE PRODUCTION OF A FIN FIELD EFFECT TRANSISTOR MEMORY CELL

机译:鳍式场效应晶体管存储池,鳍式场效应晶体管存储池布置以及制造鳍式场效应晶体管存储池的方法

摘要

The present invention relates to a process for producing a pin field effect transistor memory cell (200), the pin field effect transistor memory cell arrangement, and the pin field effect transistor memory cell. The fin field effect transistor memory cell comprises first and second source / drain regions 201 and 202, and gate regions. Memory cells surrounding the channel region between the first source / drain region and the second source / drain region further comprises a semiconductor fin (204). In addition, at least in part to the charge storage layer disposed on the gate region (207, 208) can be provided. A word line region (205, 206) is disposed on at least a section of the charge storage layer. A charge storage layer, the charge carriers by electrical pin field effect transistor is a pre-defined potential to the memory cells is selectively introduced into the charge storage layer or be designed to be removed from the charge storage layer.
机译:本发明涉及一种用于制造pin场效应晶体管存储单元(200),pin场效应晶体管存储单元布置和pin场效应晶体管存储单元的方法。鳍式场效应晶体管存储单元包括第一和第二源极/漏极区域201和202以及栅极区域。围绕第一源/漏区和第二源/漏区之间的沟道区的存储单元还包括半导体鳍(204)。另外,可以至少部分地提供给设置在栅极区域(207、208)上的电荷存储层。字线区域(205、206)设置在电荷存储层的至少一部分上。电荷存储层中,通过电针型场效应晶体管的电荷载流子是将存储单元的预定电位选择性地引入到电荷存储层中或设计为从电荷存储层中去除。

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