首页> 外国专利> PLASMA REACTOR WITH MULTI ARRAYED DISCHARGING CHAMBER AND ATMOSPHERIC PRESSURE PLASMA PROCESSING SYSTEM USING THE SAME

PLASMA REACTOR WITH MULTI ARRAYED DISCHARGING CHAMBER AND ATMOSPHERIC PRESSURE PLASMA PROCESSING SYSTEM USING THE SAME

机译:具有多排出口室的等离子反应器和使用相同的常压等离子处理系统

摘要

A plasma reactor having a multi arrayed discharge chamber and an atmospheric pressure plasma processing system are provided to generate uniformly plasma in a large sized range by increasing the number and length of the discharge chamber. A plasma reactor includes a reactor body(110) with a plurality of discharging chambers, a plasma spray slit, a transformer, a core protection tube and a first power supply source. The plasma spray slit is formed at the reactor body along the plurality of discharging chambers. The transformer(120) includes a magnetic core and a primary winding connected to the discharging chambers. The first power supply source is electrically connected to the primary winding. The current of the primary winding is driven by the first power supply source. The driving current of the primary winding is used for completing a secondary circuit of the transformer, so that an inductively coupled plasma is generated to induce an AC potential in each discharging chamber and to enclose an outer portion of the core protection tube.
机译:提供具有多排放电室的等离子体反应器和大气压等离子体处理系统,以通过增加放电室的数量和长度而在大尺寸范围内均匀地产生等离子体。等离子体反应器包括具有多个放电室的反应器主体(110),等离子体喷雾狭缝,变压器,堆芯保护管和第一电源。等离子喷雾狭缝沿着多个排出室在反应器主体处形成。变压器(120)包括磁芯和连接到放电室的初级绕组。第一电源电连接到初级绕组。初级绕组的电流由第一电源驱动。初级绕组的驱动电流用于完成变压器的次级电路,从而产生感应耦合的等离子体,以在每个放电室中感应出交流电,并包围芯部保护管的外部。

著录项

  • 公开/公告号KR100761688B1

    专利类型

  • 公开/公告日2007-09-28

    原文格式PDF

  • 申请/专利权人 NEW POWER PLASMA CO. LTD.;

    申请/专利号KR20060042062

  • 发明设计人 CHOI DAI KYU;WI SOON IM;

    申请日2006-05-10

  • 分类号H01L21/3065;

  • 国家 KR

  • 入库时间 2022-08-21 20:31:16

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