首页> 外国专利> SURFACE TREATMENT METHOD OF ITO USING OXYGEN PLASMA AND THERMAL TREATMENT AND OLED DEVICE USING THE SAME METHOD

SURFACE TREATMENT METHOD OF ITO USING OXYGEN PLASMA AND THERMAL TREATMENT AND OLED DEVICE USING THE SAME METHOD

机译:氧等离子体的ITO表面处理方法及相同方法的热处理和OLED器件

摘要

An ITO(Indium Tin Oxide) surface treatment method using an oxygen plasma and an OLED device using the same are provided to enhance an absorption property of oxygen by accelerating a reaction speed of an oxygen plasma process. A multilayer OLED(Organic Light Emitting Device) includes an anode(2), a first region(3), an HTL(Hole Transport Layer)(4), an EML(Emitting Layer)(5), a buffer layer(6), and a cathode(7). An oxygen plasma thermal treatment is performed on the first region on an ITO. Holes are transferred in the HTL. Holes are combined with electrons in the EML. The cathode is made of aluminum. A transparent material is used for forming one electrode of a substrate, such that the light is emitted from the OLED. The transparent material is used as the anode, which injects the holes. The HTL is made of TPD(Triphenyl Diamine).
机译:提供了使用氧等离子体的ITO(氧化铟锡)表面处理方法和使用该方法的OLED装置,以通过加速氧等离子体处理的反应速度来增强氧的吸收特性。多层OLED(有机发光装置)包括阳极(2),第一区域(3),HTL(空穴传输层)(4),EML(发光层)(5),缓冲层(6) ,和阴极(7)。在ITO上的第一区域上进行氧等离子体热处理。孔在HTL中转移。空穴在EML中与电子结合。阴极由铝制成。透明材料用于形成基板的一个电极,使得光从OLED发射。透明材料用作阳极,注入空穴。 HTL由TPD(三苯二胺)制成。

著录项

  • 公开/公告号KR100765728B1

    专利类型

  • 公开/公告日2007-10-11

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20060029823

  • 发明设计人 채희엽;장선기;이재원;정동훈;

    申请日2006-03-31

  • 分类号H05B33/10;

  • 国家 KR

  • 入库时间 2022-08-21 20:31:13

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