Device for plasma - processing with in - situ - monitoring and in - situ - monitoring method for such a device

摘要

Device for plasma - processing with in - situ - monitoring comprising the following components:1.1 a process chamber for the plasma processing;1.2 a drawer, which is connected with the process chamber locks chamber in which the articles to be processed are held under a high vacuum;1.3 Monitoring devices for monitoring the pressure changes in the process chamber and of the drawer locks chamber;1.4 a standing in connection with the process chamber process gas - supply device for supplying a process gas into the process chamber;1.5 a standing in connection with the process chamber exhaust gas outlet device for removing exhaust gases from the process chamber, with the use of a pump device;1.6, which is connected with the process chamber a sample withdrawal - distributing device with a pump device to the removal of gas samples of the gas located in the process chamber by means of a pressure difference, further comprising an opening, to enable the internal pressure of the sampling - distributing device on a lower pressure to keep in comparison to the process chamber;1.7 Devices for the supply of carrier gas into the process chamber and into the sample withdrawal - distributor;1.8 a gas analysis no the direction of the analysis..