首页> 外国专利> Gantry system useful for particle therapy system for therapy plan and radiation method, particularly for irradiating volume, comprises first and second beam guiding devices guides particle beams

Gantry system useful for particle therapy system for therapy plan and radiation method, particularly for irradiating volume, comprises first and second beam guiding devices guides particle beams

机译:龙门架系统,用于粒子治疗系统,用于治疗计划和放射方法,特别是用于照射体积,包括用于引导粒子束的第一和第二束导向装置

摘要

A gantry system (1) comprises two beam guiding devices (5, 7). The first beam guiding device is rotatable about an axis of rotation of a gantry. The first beam guiding device is operable to guide the particle beam so that the particle beam strikes a treatment location at a gantry incidence direction. The gantry incidence direction deviates from an axis of rotation and is variable. The second beam guiding device is operable to guide the particle beam to a treatment location in a second direction different than the gantry incidence direction. The second direction is parallel to the axis of rotation. The second beam guiding device is non-rotatable and is mechanically optionally uncoupled from the first beam guiding device and is operable to rotate with the first beam guiding device. The system includes beam monitoring unit. The two beam guiding devices have has a scanner, and/or scattering device. The particle therapy system is switchable between =2 of protons, pions, helium ion, carbon ion, and oxygen ion therapy. The second sub-treatment plan defines a radiation based on the radiation parameters of the particle number, particle energy, and/or particle type. The second direction is a direction not obtainable by the first beam guiding device. Independent claims are also included for: (1) particle therapy system (3); (2) operating method for operating a particle therapy system; and (3) treatment plan for irradiating a patient with particles of a particle therapy system.
机译:龙门系统(1)包括两个光束引导装置(5、7)。第一光束引导装置可绕台架的旋转轴线旋转。第一射束引导装置可操作来引导粒子束,以使粒子束撞击龙门架入射方向上的治疗位置。龙门架入射方向偏离旋转轴并且是可变的。第二射束引导装置可操作为将粒子束沿不同于机架入射方向的第二方向引导至治疗位置。第二方向平行于旋转轴线。第二光束引导装置是不可旋转的,并且在机械上可选地与第一光束引导装置解耦,并且可操作以与第一光束引导装置一起旋转。该系统包括光束监测单元。两个光束引导装置具有扫描仪和/或散射装置。粒子治疗系统可在> = 2的质子,介子,氦离子,碳离子和氧离子治疗之间切换。第二子处理计划基于粒子数量,粒子能量和/或粒子类型的辐射参数定义辐射。第二方向是第一光束引导装置无法获得的方向。还包括以下方面的独立权利要求:(1)粒子治疗系统(3); (2)用于操作粒子治疗系统的操作方法; (3)用粒子治疗系统的粒子照射患者的治疗计划。

著录项

  • 公开/公告号DE102005041122B3

    专利类型

  • 公开/公告日2007-05-31

    原文格式PDF

  • 申请/专利权人 SIEMENS AG;

    申请/专利号DE20051041122

  • 申请日2005-08-30

  • 分类号A61N5/10;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:47

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