首页> 外国专利> Highly dispersed pyrogenic silicic acid, obtained by applying ammonium base and reactive double bonds on surface of acid particle, suspending hydrophilic acid in diallyldimethyl ammonium chloride and removing solvent, useful as e.g. filler

Highly dispersed pyrogenic silicic acid, obtained by applying ammonium base and reactive double bonds on surface of acid particle, suspending hydrophilic acid in diallyldimethyl ammonium chloride and removing solvent, useful as e.g. filler

机译:高度分散的热解硅酸,是通过在酸颗粒表面施加铵碱和反应性双键,将亲水性酸悬浮在二烯丙基二甲基氯化铵中并除去溶剂而制得的。填料

摘要

Highly dispersed pyrogenic silicic acid with a functionalized surface, obtained by applying a quaternary ammonium base and reactive double bonds on the surface of the silicic acid particle; suspending the hydrophilic silicic acid in a diallyldimethylammonium chloride solution and optionally removing the solvent.
机译:通过在硅酸粒子的表面上施加季铵盐基和反应性双键而获得的,具有功能化表面的高度分散的热解硅酸;将亲水性硅酸悬浮在二烯丙基二甲基氯化铵溶液中,并可选地除去溶剂。

著录项

  • 公开/公告号DE102005043739A1

    专利类型

  • 公开/公告日2007-03-22

    原文格式PDF

  • 申请/专利权人 SIEGEL ROLF;

    申请/专利号DE20051043739

  • 发明设计人 SIEGEL ROLF;

    申请日2005-09-14

  • 分类号C01B33/18;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:46

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