首页> 外国专利> Exposure device for lithographic projects has electromagnetic trap in container for collecting neutral particles emitted during operation of radiation source by ionization arrangement ionizing neutral particles

Exposure device for lithographic projects has electromagnetic trap in container for collecting neutral particles emitted during operation of radiation source by ionization arrangement ionizing neutral particles

机译:用于光刻项目的曝光装置在容器中具有电磁陷阱,用于通过电离装置将中性粒子电离来收集在辐射源运行期间发射的中性粒子

摘要

The device has a container (10), a radiation source (12) in the container for radiating electromagnetic radiation of a defined wavelength, a reticle in the container, a substrate holder, a projection lens and an electromagnetic trap (20) in the container for collecting neutral particles emitted during operation of the radiation source by an ionization arrangement (30) ionizing the neutral particles. An independent claim is also included for a method of operating. an inventive device.
机译:该装置具有容器(10),容器中的用于辐射限定波长的电磁辐射的辐射源(12),容器中的标线片,衬底支架,投影透镜和容器中的电磁阱(20)通过电离装置(30)使中性粒子电离,用于收集在辐射源工作期间发射的中性粒子。还包括一种独立的索赔方法。有创造力的设备。

著录项

  • 公开/公告号DE102005044141A1

    专利类型

  • 公开/公告日2007-04-05

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE20051044141

  • 发明设计人 NOELSCHER CHRISTOPH;KAMM FRANK-MICHAEL;

    申请日2005-09-15

  • 分类号G03F7/20;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:44

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